Empirical tight-binding parameters for wurtzite group III–V(non-nitride) and IV materials
Author:
Affiliation:
1. Department of Physics and Astronomy, and Optical Science and Technology Center, University of Iowa , Iowa City, Iowa 52242, USA
Abstract
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
https://pubs.aip.org/aip/adv/article-pdf/doi/10.1063/5.0129007/16760541/025354_1_online.pdf
Reference78 articles.
1. Simultaneous selective area growth of wurtzite and zincblende self-catalyzed GaAs nanowires on silicon;Nano Lett.,2021
2. Selective area epitaxy of III–V nanostructure arrays and networks: Growth, applications, and future directions;Applied Physics Reviews,2021
3. Understanding shape evolution and phase transition in InP nanostructures grown by selective area epitaxy;Small,2021
4. Exploring the size limitations of wurtzite III–V film growth;Nano Lett.,2020
5. Effect of radius on crystal structure selection in III–V nanowire growth;Cryst. Growth Des.,2020
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Direct bandgap quantum wells in hexagonal Silicon Germanium;Nature Communications;2024-06-19
2. Wurtzite/zinc-blende crystal-phase GaAs heterostructures in the tight-binding approximation;Physical Review B;2023-08-02
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