Influence of stress on structural properties of AlGaN/GaN high electron mobility transistor layers grown on 150 mm diameter Si (111) substrate
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4774288
Reference25 articles.
1. Epitaxy of GaN on silicon—impact of symmetry and surface reconstruction
2. J. W. Chung, K. Ryu, B. Liu, and T. Palacios, in Proceedings of the European IEEE Solid-State Device Research Conference (ESSDERC) (IEEE, 2010), pp. 52–56.
3. GaN-based LEDs grown on 6-inch diameter Si (111) substrates by MOVPE
4. MOVPE growth of GaN on Si(111) substrates
5. Stress and Defect Control in GaN Using Low Temperature Interlayers
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