Residual lattice strain in thin silicon-on-insulator bonded wafers: Effects on electrical properties and Raman shifts
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1338521
Reference21 articles.
1. Controlling the device field edge to achieve a low power TFSOI technology
2. Investigation of anomalous leakage current in mesa-isolated SOI MOSFETs
3. Residual lattice strain in thin silicon-on-insulator bonded wafers: Thermal behavior and formation mechanisms
4. Characterization of semiconductor materials by Raman microprobe
5. Effect of static uniaxial stress on the Raman spectrum of silicon
Cited by 14 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Roughness Suppression in Electrochemical Nanoimprinting of Si for Applications in Silicon Photonics;Advanced Materials;2022-09-27
2. Residual stresses at cavity corners in silicon-on-insulator bonded wafers;Journal of Micromechanics and Microengineering;2013-08-01
3. Local-Stress-Induced Trap States in SOI Layers With Different Levels of Roughness at SOI/BOX Interfaces;IEEE Electron Device Letters;2011-03
4. In-depth profiling of electron trap states in silicon-on-insulator layers and local mechanical stress near the silicon-on-insulator/buried oxide interface in separation-by-implanted-oxygen wafers;Journal of Applied Physics;2010-12-15
5. Balancing temperature dependence of on-wafer SOS inductors;Microelectronics Reliability;2006-07
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3