Effects of aspect ratio on electron loss mechanisms and plasma uniformity in cylindrical inductively coupled plasma-Reference-Cited by-同舟云学术

Effects of aspect ratio on electron loss mechanisms and plasma uniformity in cylindrical inductively coupled plasma

Published:2020-04 Issue:4 Volume:27 Page:043502
ISSN:1070-664X
Container-title:Physics of Plasmas
language:en
Short-container-title:Physics of Plasmas

Author:

Hao Zeyu¹,Hua Yue¹,Song Jian¹,Ren Chunsheng¹^ORCID

Affiliation:

1. Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams (Dalian University of Technology), Ministry of Education, Dalian 116023, China

Funder

National Natural Science Foundation of China

Publisher

AIP Publishing

Subject

Condensed Matter Physics

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5143099

Reference34 articles.

1. Investigation of electron source and ion flux uniformity in high plasma density inductively coupled etching tools using two-dimensional modeling

2. Ionized physical vapor deposition (IPVD): A review of technology and applications

3. Review of inductively coupled plasmas for plasma processing

4. Ion flux uniformity in inductively coupled plasma sources

5. Hybrid simulations of solenoidal radio-frequency inductively coupled hydrogen discharges at low pressures

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