Development of a simple cost-effective maskless-photolithography system-Reference-Cited by-同舟云学术

Development of a simple cost-effective maskless-photolithography system

Published:2019 Issue: Volume: Page:
ISSN:0094-243X
Container-title:DAE SOLID STATE PHYSICS SYMPOSIUM 2018
language:
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Author:

Haldar S.,Vashisht Geetanjali,Ghosh U. K.,Jaiswal A. K.,Porwal S.,Khakha A.,Sharma T. K.,Dixit V. K.

Publisher

AIP Publishing

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5113058

Reference10 articles.

1. Laser interference lithography for nanoscale structuring of materials: From laboratory to industry

2. Fabrication of nanostructures with laser interference lithography

3. Optical System with 4 ㎛ Resolution for Maskless Lithography Using Digital Micromirror Device

4. K. Jain, T.J. Dunn and J.M. Hoffman, “Seamless, maskless lithography system using spatial light modulator,” U.S. Patent No. 6,312,134 (6 November 2001).

5. High speed maskless lithography of printed circuit boards using digital micromirrors

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