Setup for photolithography on microscopic flakes of 2D materials by combining simple-geometry mask projection with writing
Author:
Affiliation:
1. Department of Condensed Matter Physics and Materials Science, Tata Institute of Fundamental Research, Mumbai 400005, India
Funder
Department of Atomic Energy, Government of India
Publisher
AIP Publishing
Subject
Instrumentation
Link
https://aip.scitation.org/doi/pdf/10.1063/5.0072808
Reference15 articles.
1. Two-Dimensional Transition-Metal Dichalcogenides
2. Micromask Lithography for Cheap and Fast 2D Materials Microstructures Fabrication
3. Nanofabrication by electron beam lithography and its applications: A review
4. 5-nm-Order Electron-Beam Lithography for Nanodevice Fabrication
5. Optical lithography technique for the fabrication of devices from mechanically exfoliated two-dimensional materials
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