Segregation and activation of Sb implanted in Si by UV nanosecond-laser-anneal-induced non-equilibrium solidification
Author:
Affiliation:
1. Laser Systems & Solutions of Europe (LASSE), 14-38 rue Alexandre, Bldg D, F-92230 Gennevilliers, France
2. IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/5.0005176
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1. Non-Equilibrium Growth of Surface Wrinkles Emerging in an SiO2/Si Stack during Si Melting Induced by UV Nanosecond Pulsed Laser Annealing;ECS Journal of Solid State Science and Technology;2022-10-01
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3. Microsecond non-melt UV laser annealing for future 3D-stacked CMOS;Applied Physics Express;2022-05-18
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