High-energy He-ion irradiation-induced defects and their influence on the noise behavior of Pd/n-Si1−xGex Schottky junctions
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.126771
Reference21 articles.
1. Heterojunction bipolar transistors using Si-Ge alloys
2. The n-channel SiGe/Si modulation-doped field-effect transistor
3. Relationship between implantation damage and electrical activation in gallium arsenide implanted with Si+
4. Local Ga implantation with focused ion beam and ambipolar lateral carrier transport in strained Si1−xGex /Si quantum wells
5. Subpicosecond carrier lifetimes in radiation‐damaged GaAs
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1. Deep-level transient spectroscopy study of theEcenter inn−Siand partially relaxedn−Si0.9Ge0.1alloy layers;Physical Review B;2008-01-30
2. DENSITY OF SURFACE STATES IN Pd/SiGe/Si INTERFACE FROM CAPACITANCE MEASUREMENTS;Surface Review and Letters;2007-08
3. Potential barrier inhomogeneities in irradiated Pd/n-SiGe Schottky diodes;Applied Physics A;2007-06-20
4. Influence of He-ion irradiation on the characteristics of Pd/n-Si0.90Ge0.10/Si Schottky contacts;Journal of Physics D: Applied Physics;2007-02-16
5. Processing-Induced Defects in Epitaxially Grown p- and n-Type SiGe;Defect and Diffusion Forum;2001-11
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