Impact of magnetron configuration on plasma and film properties of sputtered aluminum nitride thin films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2978226
Reference30 articles.
1. Preparation of aluminum nitride thin films by reactive sputtering and their applications to GHz‐band surface acoustic wave devices
2. Thermal expansion of some diamondlike crystals
3. Thermal stability of indium nitride at elevated temperatures and nitrogen pressures
4. Lattice Vibration Spectra of Aluminum Nitride
5. Epitaxial growth of AlN by plasma-assisted, gas-source molecular beam epitaxy
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