Preparation of aluminum nitride thin films by reactive sputtering and their applications to GHz‐band surface acoustic wave devices
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.111553
Reference14 articles.
1. Orientation Control of AlN Film by Electron Cyclotron Resonance Ion Beam Sputtering
2. Reflection high energy electron diffraction and X-ray studies of AlN films grown on Si(111) and Si(001) by organometallic chemical vapour deposition
3. Zero-Temperature-Coefficient SAW Devices on AlN Epitaxial Films
4. Plasma CVD of Amorphous AlN from Metalorganic Al Source and Properties of the Deposited Films
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