Measured cross sections and ion energies for a CHF3 discharge
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1491276
Reference23 articles.
1. Control of relative etch rates of SiO2 and Si in plasma etching
2. Selective etching of SiO2 over polycrystalline silicon using CHF3 in an inductively coupled plasma reactor
3. Fluorocarbon high‐density plasmas. I. Fluorocarbon film deposition and etching using CF4 and CHF3
4. Fluorocarbon high‐density plasmas. II. Silicon dioxide and silicon etching using CF4 and CHF3
5. Reactive ion etching of silica structures for integrated optics applications
Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. C–F and C–H bond cleavage mechanisms of trifluoromethane ions in low-lying electronic states: threshold photoelectron–photoion coincidence imaging and theoretical investigations;Physical Chemistry Chemical Physics;2020
2. Cross sections and transport properties of positive ions in BF3 plasmas;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2012-05
3. Electron and ion swarm data of fluorinated gases used in plasma processing;Journal of Physics: Conference Series;2007-05-01
4. Dissociative scattering of hyperthermal energy CF3+ ions from modified surfaces;The Journal of Chemical Physics;2007-02-28
5. Threshold photoelectron photoion coincidence spectroscopy and selected ion flow tube reactions of CHF3: comparison of product branching ratios§;Molecular Physics;2006-01-20
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3