Mechanisms for dose retention in conformal arsenic doping using a radial line slot antenna microwave plasma source
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4922412
Reference31 articles.
1. New doping method for subhalf micron trench sidewalls by using an electron cyclotron resonance plasma
2. Plasma Immersion Ion Implantation for Electronic Materials
3. Production-Worthy USJ Formation by Self-Regulatory Plasma Doping Method
4. A novel plasma-based technique for conformal 3D FINFET doping
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1. (Invited) Challenges for Etch Technology and the Integration of New Channel Materials Beyond 7 nm;ECS Transactions;2017-04-27
2. Implementation of atomic layer etching of silicon: Scaling parameters, feasibility, and profile control;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2016-05
3. Microwave plasma doping: Arsenic activation and transport in germanium and silicon;Japanese Journal of Applied Physics;2016-03-15
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