Implementation of atomic layer etching of silicon: Scaling parameters, feasibility, and profile control-Reference-Cited by-同舟云学术

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Implementation of atomic layer etching of silicon: Scaling parameters, feasibility, and profile control

Published:2016-05 Issue:3 Volume:34 Page:031304
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Ranjan Alok,Wang Mingmei,Sherpa Sonam D.,Rastogi Vinayak,Koshiishi Akira,Ventzek Peter L. G.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4944850

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