Native target chemistry during reactive dc magnetron sputtering studied by ex-situ x-ray photoelectron spectroscopy
Author:
Affiliation:
1. Thin Film Physics Division, Department of Physics (IFM), Linköping University, SE-581 83 Linköping, Sweden
2. Materials Chemistry, RWTH Aachen University, Kopernikusstr. 10, D-52074 Aachen, Germany
Funder
Åforsk Foundation
Swedish Government Strategic Area Research Grant
Deutsche Forschungsgemeinschaft (DFG)
Carl Tryggers Stiftelse för Vetenskaplig Forskning (Carl Trygger Foundation)
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4993787
Reference48 articles.
1. On structure and properties of sputtered Ti and Al based hard compound films
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4. Titanium nitride coating for aero engine compressor gas path components
5. Interfacial reactions in epitaxial Al/Ti1−xAlxN (0≤x≤0.2) model diffusion‐barrier structures
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