Interfacial reactions in epitaxial Al/Ti1−xAlxN (0≤x≤0.2) model diffusion‐barrier structures-Reference-Cited by-同舟云学术

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Interfacial reactions in epitaxial Al/Ti1−xAlxN (0≤x≤0.2) model diffusion‐barrier structures

Published:1993-01 Issue:1 Volume:11 Page:11-17
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Petrov I.,Mojab E.,Adibi F.,Greene J. E.,Hultman L.,Sundgren J.‐E.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.578277

Cited by 47 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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2. Semi-Empirical Force-Field Model for the Ti1−xAlxN (0 ≤ x ≤ 1) System;Materials;2019-01-10

3. Influence of backscattered neutrals on the grain size of magnetron-sputtered TaN thin films;Thin Solid Films;2018-07

4. Native target chemistry during reactive dc magnetron sputtering studied by ex-situ x-ray photoelectron spectroscopy;Applied Physics Letters;2017-07-10

5. Core-level spectra and binding energies of transition metal nitrides by non-destructive x-ray photoelectron spectroscopy through capping layers;Applied Surface Science;2017-02

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