Measurement of negative ion fluxes during DC reactive magnetron sputtering of Ti in Ar/O2 atmosphere using a magnetic-filtering probe
Author:
Funder
Thailand Research Fund
Office of the Higher Education Commission
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference65 articles.
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2. Comparison of ion energies and fluxes at the substrate during magnetron sputtering of ZnO : Al for dc and rf discharges;Welzel;J. Phys. D Appl. Phys.,2013
3. Spatial variation of negative oxygen ion energy distribution in RF magnetron plasma with oxide target;Ishijima;Jpn. J. Appl. Phys.,2009
4. Recent aspects concerning DC reactive magnetron sputtering of thin films: a review;Safi;Surf. Coating. Technol.,2000
5. Fundamental understanding and modeling of reactive sputtering processes;Berg;Thin Solid Films,2005
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