I‐Vcharacteristics of electron‐cyclotron‐resonance plasma‐enhanced chemical‐vapor‐deposition silicon nitride thin films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.356455
Reference21 articles.
1. LPCVD Oxide/LPCVD Nitride Stacks for Interpoly Dielectrics
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3. Silicon nitride films grown on silicon below 300 °C in low power nitrogen plasma
4. Silicon nitride produced by catalytic chemical vapor deposition method
5. Hot-Wall Chemical-Vapor-Deposition of Amorphous-Silicon and Its Application to Thin-Film Transistors
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