ECR plasma deposited a-SiCN:H as insulating layer in piezoceramic modules
Author:
Funder
German Research Foundation
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference52 articles.
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3. Mid-frequency PECVD of a-SiCN: H films and their structural, mechanical and electrical properties;Peter;Vacuum,2013
4. Review - silicon nitride and silicon nitride-rich thin film technologies: trends in deposition techniques and related applications;Kaloyeros;ECS J. Solid State Sci. Technol,2017
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3. Annealing effects on a-SiC:H and a-SiCN:H films deposited by plasma CVD methods;Vacuum;2020-08
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