Measurement of deposition rate and ion energy distribution in a pulsed dc magnetron sputtering system using a retarding field analyzer with embedded quartz crystal microbalance-Reference-Cited by-同舟云学术

Measurement of deposition rate and ion energy distribution in a pulsed dc magnetron sputtering system using a retarding field analyzer with embedded quartz crystal microbalance

Published:2016-04 Issue:4 Volume:87 Page:043511
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Sharma Shailesh¹²^ORCID,Gahan David²,Scullin Paul²,Doyle James²,Lennon Jj²,Vijayaraghavan Rajani K.¹,Daniels Stephen¹,Hopkins M. B.²

Affiliation:

1. Dublin City University, Glasnevin, Dublin 9, Ireland

2. Impedans Limited, Chase House, City Junction Business Park, Northern Cross, D17 AK63, Dublin 17, Ireland

Funder

Irish Research Council

Publisher

AIP Publishing

Subject

Instrumentation

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4946788

Reference22 articles.

1. Anode effects on energetic particle bombardment of the substrate in pulsed magnetron sputtering

2. Pulsed magnetron sputter technology

3. High-rate reactive DC magnetron sputtering of oxide and nitride superlattice coatings

4. Ionization of sputtered metals in high power pulsed magnetron sputtering

5. Fundamental characteristics of built‐in high‐frequency coil‐type sputtering apparatus

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