Three-dimensional simulation of laser-produced plasma for extreme ultraviolet lithography applications
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2365717
Reference29 articles.
1. Proceedings of the International SEMATECH EUV Source Workshop;Bakshi V.,2004
2. Fundamentals and limits for the EUV emission of pinch plasma sources for EUV lithography
3. Integrating Philips' extreme UV source in the alpha-tools
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