A molecular dynamics model for the interaction of energetic ions with SiOCH low-κ dielectric
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2512700
Reference47 articles.
1. Low dielectric constant films prepared by plasma-enhanced chemical vapor deposition from tetramethylsilane
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3. Structure of low dielectric constant to extreme low dielectric constant SiCOH films: Fourier transform infrared spectroscopy characterization
4. Low-kSi–O–C–H composite films prepared by plasma-enhanced chemical vapor deposition using bis-trimethylsilylmethane precursor
5. Plasma-enhanced chemical vapor deposition of low-kdielectric films using methylsilane, dimethylsilane, and trimethylsilane precursors
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