Electronic origin of the stability trend in TiSi2 phases with Al or Mo layers
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.122336
Reference15 articles.
1. Low temperature formation of C54–TiSi2 using titanium alloys
2. Low temperature formation of C54–TiSi2 using titanium alloys
3. Low temperature formation of C54–TiSi2 using titanium alloys
4. Low temperature formation of C54–TiSi2 using titanium alloys
5. Low temperature formation of C54–TiSi2 using titanium alloys
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2. Impact of nanosecond laser energy density on the C40-TiSi2 formation and C54-TiSi2 transformation temperature;Journal of Applied Physics;2020-08
3. Metal silicides in advanced complementary metal-oxide-semiconductor (CMOS) technology;Metallic Films for Electronic, Optical and Magnetic Applications;2014
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