Thermal stability of Ta2O5 in metal–oxide–metal capacitor structures
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.123227
Reference10 articles.
1. Leakage Current Mechanism of Amorphous and Polycrystalline Ta2 O 5 Films Grown by Chemical Vapor Deposition
2. Leakage currents in amorphous Ta2O5 thin films
3. Dielectric properties of Ta2O5–ZrO2 polycrystalline ceramics
4. AES and XPS study of thin RF-sputtered Ta2O5 layers
5. Effects of Electrode Materials and Annealing Ambients on the Electrical Properties ofTiO2Thin Films by Metalorganic Chemical Vapor Deposition
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