7.86 kV GaN-on-GaN PN power diode with BaTiO3 for electrical field management

Author:

Xu Yibo1ORCID,Vangipuram Vijay Gopal Thirupakuzi1,Talesara Vishank1ORCID,Cheng Junao1ORCID,Zhang Yuxuan1ORCID,Hashimoto Tadao2ORCID,Letts Edward2ORCID,Key Daryl2ORCID,Zhao Hongping1ORCID,Lu Wu1ORCID

Affiliation:

1. Electrical and Computer Engineering Department, Ohio State University 1 , Columbus, Ohio 43210, USA

2. SixPoint Materials Inc. 2 , Buellton, California 93427, USA

Abstract

Devices based on gallium nitride (GaN) have great potential for high power switching applications due to the high breakdown field and high electron mobility. In this work, we present a vertical GaN-on-GaN PN power diode using high dielectric constant material, BaTiO3, for electrical field management and high breakdown voltages, in together with an optimized guard-ring and field plate design. Numerical simulation shows that with high-k dielectrics implemented, the peak electrical field at the PN interface is mitigated from 3.5 to 3.1 MV/cm under a reverse bias of −9.05 kV. The device design with BaTiO3 shows a breakdown voltage of 9.65 kV or about 600 V improvement. The fabricated diodes with a 57 μm thick drift layer demonstrate a breakdown voltage of 7.86 kV on a bulk GaN substrate. The device has an on-resistance of 2.8 mΩ cm2 and a Baliga figure of merit of 22 GW/cm2.

Funder

Lawrence Livermore National Laboratory

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

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