Nanoscale film thickness measurement based on weak measurement-Reference-Cited by-同舟云学术

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Nanoscale film thickness measurement based on weak measurement

Published:2020-12-01 Issue:12 Volume:91 Page:123111
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Qin Zirui¹²^ORCID,Liu Qinggang¹^ORCID,Yue Chong¹,Lang Yaopu¹,Zhou Xinglin³

Affiliation:

1. State Key Laboratory of Precision Measurement Technology and Instruments, Tianjin University, Tianjin 300072, China

2. School of Electrical and Information Engineering, Zhengzhou University of Light Industry, Zhengzhou 450002, China

3. School of Communications, Wuhan University of Science and Technology, Wuhan 430081, China

Funder

Doctoral Research Foundation of Zhengzhou University of Light Industry

National Natural Science Foundation of China

Publisher

AIP Publishing

Subject

Instrumentation

Link

http://aip.scitation.org/doi/pdf/10.1063/5.0025552

Reference29 articles.

1. Determination of thickness and optical constants of amorphous silicon films from transmittance data

2. Thin-Film Optical Filters

3. Surface finish prediction models for precision grinding of silicon

4. Nanoscale Investigation of Grain Growth in RF-Sputtered Indium Tin Oxide Thin Films by Scanning Probe Microscopy

5. Measuring the relative interface thickness of multilayer polyolefin films with atomic force microscopy

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1. Progress and perspectives on weak-value amplification;Progress in Quantum Electronics;2024-07

2. Thickness Distribution Measurement for Spin-Coated and Inkjet-Printed Transparent Organic Layers Using a UV Light Extinction Image Method;Coatings;2024-06-11

3. Optimized weak measurement model for in-plane and out-of-plane splitting shifts of Photonic Spin Hall effect;Optics Communications;2024-04

4. Signature of the photonic spin Hall effect in monolayer MoS₂ via weak measurement;Journal of the Optical Society of America B;2022-06-13

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