Optimization of the size ratio of Sn sphere and laser focal spot for an extreme ultraviolet light source
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3036956
Reference13 articles.
1. Extreme ultraviolet lithography: overview and development status
2. Effect of focal spot size on in-band 135 nm extreme ultraviolet emission from laser-produced Sn plasma
3. Low-density tin targets for efficient extreme ultraviolet light emission from laser-produced plasmas
4. Geometric effects on EUV emissions in spherical and planar targets
5. Two dimensional radiation hydrodynamic simulation for extreme ultra-violet emission from laser-produced tin plasmas
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2. Characterization of angularly resolved EUV emission from 2-µm-wavelength laser-driven Sn plasmas using preformed liquid disk targets;Journal of Physics D: Applied Physics;2021-06-28
3. Research progress on laser-produced plasma light source for 13.5 nm extreme ultraviolet lithography;Chinese Optics;2020
4. Calculation of the extreme-ultraviolet radiation conversion efficiency for a laser-produced tin plasma source;Physics Open;2019-12
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