Repair of phase defects in extreme-ultraviolet lithography mask blanks-Reference-Cited by-同舟云学术

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Repair of phase defects in extreme-ultraviolet lithography mask blanks

Published:2004-12 Issue:11 Volume:96 Page:6812-6821
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Hau-Riege Stefan P.,Barty Anton,Mirkarimi Paul B.,Baker Sherry,Coy Michael A.,Mita Masaaki,Robertson Vernon E.,Liang Ted,Stivers Alan

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.1812826

Reference27 articles.

1. Low‐Loss Reflection Coatings Using Absorbing Materials

2. Advances in low-defect multilayers for EUVL mask blanks

3. Developing a viable multilayer coating process for extreme ultraviolet lithography reticles

4. Method for repairing Mo/Si multilayer thin film phase defects in reticles for extreme ultraviolet lithography

5. Practical approach for modeling extreme ultraviolet lithography mask defects

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. An in-process measurement method for repair of defective microstructures by using a fast tool servo with a force sensor;Precision Engineering;2015-01

2. Observation of Residual-Type Thin Absorber Defect on Extreme Ultraviolet Lithography Mask Using an Extreme Ultraviolet Microscope;Applied Physics Express;2013-04-01

3. Ebeam based mask repair as door opener for defect free EUV masks;SPIE Proceedings;2012-11-08

4. EUVL mask repair: expanding options with nanomachining;SPIE Proceedings;2012-11-08

5. Laser-Induced Plasma Exposure on Extreme Ultraviolet Lithography Masks: Damage Analysis;IEEE Transactions on Semiconductor Manufacturing;2012-11

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