Low‐temperature silicon cleaning via hydrogen passivation and conditions for epitaxy
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.103396
Reference21 articles.
1. Low‐temperature silicon epitaxy by ultrahigh vacuum/chemical vapor deposition
2. Limited reaction processing: Silicon epitaxy
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4. Vacuum evaporated silicon layers free from stacking faults
5. Dependence of residual damage on temperature during Ar+sputter cleaning of silicon
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