Laser dehydrogenation/crystallization of plasma‐enhanced chemical vapor deposited amorphous silicon for hybrid thin film transistors
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.110829
Reference6 articles.
1. High-performance TFTs fabricated by XeCl excimer laser annealing of hydrogenated amorphous-silicon film
2. On-Chip Bottom-Gate Polysilicon and Amorphous Silicon Thin-Film Transistors Using Excimer Laser Annealing
3. KrF excimer laser annealed TFT with very high field-effect mobility of 329 cm/sup 2//V-s
4. Laser Dehydrogenation of PECVD Amorphous Silicon
5. Low temperature crystallization of amorphous silicon using an excimer laser
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