Temperature and hydrogen diffusion length in hydrogenated amorphous silicon films on glass while scanning with a continuous wave laser at 532 nm wavelength-Reference-Cited by-同舟云学术

Temperature and hydrogen diffusion length in hydrogenated amorphous silicon films on glass while scanning with a continuous wave laser at 532 nm wavelength

Published:2018-10-21 Issue:15 Volume:124 Page:153103
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Beyer Wolfhard¹²^ORCID,Andrä Gudrun³,Bergmann Joachim³,Breuer Uwe⁴^ORCID,Finger Friedhelm¹,Gawlik Annett³,Haas Stefan¹,Lambertz Andreas¹,Maier Florian C.¹,Nickel Norbert H.²,Zastrow Uwe¹

Affiliation:

1. IEK-5 Photovoltaik, Forschungszentrum Jülich GmbH, D-52425 Jülich, Germany

2. Institut für Silizium-Photovoltaik, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, Kekuléstraße 5, D-12489 Berlin, Germany

3. Photovoltaische Systeme, Leibniz-Institut für Photonische Technologien e.V., Albert-Einstein-Straße 9, D-07702 Jena, Germany

4. ZEA-3 Analytik, Forschungszentrum Jülich GmbH, D-52425 Jülich, Germany

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5038090

Reference74 articles.