Crystallization of submicron amorphous hydrogenated silicon films with different hydrogen concentration by nanosecond ruby laser irradiation-Reference-Cited by-同舟云学术

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Crystallization of submicron amorphous hydrogenated silicon films with different hydrogen concentration by nanosecond ruby laser irradiation

Published:2019-02 Issue:1 Volume:31 Page:012006
ISSN:1042-346X
Container-title:Journal of Laser Applications
language:en
Short-container-title:Journal of Laser Applications

Author:

Krivyakin G. K.¹²^ORCID,Kamaev G. N.¹²,Ivlev G. D.³,Prakopyeu S. L.³,Volodin V. A.¹²

Affiliation:

1. A.V. Rzhanov Institute of Semiconductor Physics, Siberian Division of the Russian Academy of Sciences, Lavrenteva 13, Novosibirsk 630090, Russia

2. Analytical and Technological Innovation Center “High Technologies and New Materials,” Novosibirsk State University, Pirogova Street, 2, 630090 Novosibirsk, Russia

3. Department of Radiophysics and Computer Science, Belarusian State University, av. Nezavisimosti, 4, 220030 Minsk, Belarus

Funder

State research program of ISP SB RAS

Publisher

Laser Institute of America

Subject

Instrumentation,Biomedical Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Link

http://lia.scitation.org/doi/pdf/10.2351/1.5030791

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