Pulsed photothermal reflectance measurement of the thermal conductivity of sputtered aluminum nitride thin films-Reference-Cited by-同舟云学术

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Pulsed photothermal reflectance measurement of the thermal conductivity of sputtered aluminum nitride thin films

Published:2004-10-15 Issue:8 Volume:96 Page:4563-4568
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Zhao Yimin,Zhu Chunlin,Wang Sigen,Tian J. Z.,Yang D. J.,Chen C. K.,Cheng Hao,Hing Peter

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.1785850

Reference15 articles.

1. Growth and applications of Group III-nitrides

2. The intrinsic thermal conductivity of AIN

3. Microstructure and thermal conductivity of epitaxial AlN thin films

4. Thermal conduction in metallized silicon‐dioxide layers on silicon

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