Potential of discharge-based lithium plasma as an extreme ultraviolet source
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2227560
Reference25 articles.
1. Opacity Effect on Extreme Ultraviolet Radiation from Laser-Produced Tin Plasmas
2. Pseudospark electron beam as an excitation source for extreme ultraviolet generation
3. Subnanosecond Thomson scattering on a vacuum arc discharge in tin vapor
4. Investigation of a novel discharge EUV source for microlithography
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1. Simulation of Extreme Ultraviolet Radiation and Conversion Efficiency of Lithium Plasma in a Wide Range of Plasma Situations;Atoms;2024-03-12
2. Effect of Time Delay on Laser-Triggered Discharge Plasma for a Beyond EUV Source;Symmetry;2019-05-11
3. Evaluation of High Energy Density Plasma in Counter-Facing Plasma Focus Device Driven by Laser-Triggered Pulse Power System;Electrical Engineering in Japan;2018-01-23
4. Laser-Assisted Counter-Facing Plasma Focus Device as a Light Source for EUV Lithography;IEEE Transactions on Plasma Science;2017-05
5. Evaluation of High Energy Density Plasma in Counter-facing Plasma Focus Device driven by Laser Triggered Pulse Power System;IEEJ Transactions on Fundamentals and Materials;2017
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