Comparison of electrical and chemical characteristics of ultrathin HfON versus HfSiON dielectrics
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2226991
Reference27 articles.
1. Application of HfSiON as a gate dielectric material
2. Low temperature UV/ozone oxidation formation of HfSiON gate dielectric
3. High-κ gate dielectrics: Current status and materials properties considerations
4. Properties of hafnium oxide films grown by atomic layer deposition from hafnium tetraiodide and oxygen
Cited by 31 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. The electronics transport mechanism of grain and grain boundary in semiconductive hafnium oxynitride thin film;Journal of Materials Science;2019-12-02
2. Influence of NH 3 annealing on the chemical states of HfO 2 /Al 2 O 3 stacks studied by X-ray photoelectron spectroscopy;Vacuum;2016-02
3. Effects of boron incorporation on the structural, optical and electrical properties of sol–gel-derived ZrO2 gate dielectrics;Journal of Alloys and Compounds;2015-11
4. Analysis of multilayered, nitrogen-doped aluminum oxide and hafnium oxide dielectric films for wide-temperature capacitor applications;Thin Solid Films;2015-09
5. Effect of N2/Ar flow ratio on the structural and electrical properties of SrHfON thin films prepared by magnetron sputtering;Vacuum;2014-11
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3