Measurements of negative ion densities in 13.56‐MHz rf plasmas of CF4, C2F6, CHF3, and C3F8using microwave resonance and the photodetachment effect
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.350346
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1. Silicon etching mechanisms in a CF4/H2glow discharge
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