Concepts and designs of ion implantation equipment for semiconductor processing

Author:

Rose Peter H.,Ryding Geoffrey

Publisher

AIP Publishing

Subject

Instrumentation

Cited by 16 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Ion Implantation;Integrated Circuit Fabrication;2023-11-16

2. Tuning of the electronic and vibrational properties of epitaxial MoS2 through He-ion beam modification;Nanotechnology;2022-12-07

3. Empirical formula and computer code for the range of charged particles with $$Z = 2{-}103$$ and $$E = 2.5{-}500$$ AMeV in aluminum;Journal of the Korean Physical Society;2022-07-19

4. Manipulating the morphology of colloidal particles via ion beam irradiation: A route to anisotropic shaping;Advances in Colloid and Interface Science;2022-06

5. Towards Next-Generation Small-Size Boron Ion Implanting Apparatus;Proceedings of the Latvian Academy of Sciences. Section B. Natural, Exact, and Applied Sciences.;2022-04-01

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