Experience in fabricating semiconductor devices using ion implantation techniques-Reference-Cited by-同舟云学术

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Experience in fabricating semiconductor devices using ion implantation techniques

Published:1965-01 Issue: Volume:38 Page:178-179
ISSN:0029-554X
Container-title:Nuclear Instruments and Methods
language:en
Short-container-title:Nuclear Instruments and Methods

Author:

King W.J.,Burrill J.T.,Harrison S.,Martin F.,Kellett C.

Publisher

Elsevier BV

Subject

General Medicine

Reference2 articles.

1. Range of Heavy Ions in Solids

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. From nuclear physics to semiconductor manufacturing: the making of ion implantation;History and Technology;2009-09

2. Concepts and designs of ion implantation equipment for semiconductor processing;Review of Scientific Instruments;2006-11

3. History of industrial and commercial ion implantation 1906–1978;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2000-07

4. A Historical View of the Role of Ion-Implantation Defects in PN Junction Formation for Devices;MRS Proceedings;2000

5. History of some early developments in ion-implantation technology leading to silicon transistor manufacturing;Proceedings of the IEEE;1998

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