Photoluminescence of defects induced in silicon by SF6/O2reactive‐ion etching
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.360711
Reference31 articles.
1. Dry etching damage of silicon: A review
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4. Silicon roughness induced by plasma etching
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