Mask-free construction of three-dimensional silicon structures by dry etching assisted gray-scale femtosecond laser direct writing-Reference-Cited by-同舟云学术

Mask-free construction of three-dimensional silicon structures by dry etching assisted gray-scale femtosecond laser direct writing

Published:2017-02-27 Issue:9 Volume:110 Page:091602
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Liu Xue-Qing¹,Yu Lei¹,Chen Qi-Dai¹,Sun Hong-Bo¹²^ORCID

Affiliation:

1. State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, 2699 Qianjin Street, Changchun 130012, People's Republic of China

2. College of Physics, Jilin University, 2699 Qianjin Street, Changchun 130012, People's Republic of China

Funder

National Natural Science Foundation of China (NSFC)

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4977562

Reference34 articles.

1. Non-Reflecting Silicon and Polymer Surfaces by Plasma Etching and Replication

2. Optical modulation of terahertz behavior in silicon with structured surfaces

3. Silicon nanostructures for photonics and photovoltaics

4. Porous silicon structures for low-cost diffraction-based biosensing

5. A 50–100GHz ohmic contact SPDT RF MEMS silicon switch with dual axis movement

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