Comparative study of HfNx and Hf–Ge–N copper diffusion barriers on Ge
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2349470
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4. Performance Improved by Incorporating of Ru Atoms into Zr-Si Diffusion Barrier for Cu Metallization;Chinese Physics Letters;2012-09
5. Synthesis of WN(NMe 2 ) 3 as a Precursor for the Deposition of WN x Nanospheres;European Journal of Inorganic Chemistry;2012-07-13
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