Author:
Kase Masataka,Kikuchi Yoshio,Kimura Mami,Mori Haruhisa,Ogawa Tsutomu
Subject
Physics and Astronomy (miscellaneous)
Cited by
8 articles.
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1. Shallow junction formation by polyatomic cluster ion implantation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1997-01
2. Evaluation and control of defects, formed by keV-MeV implantation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1996-12
3. Ion Implantation Damage and B Diffusion in Low Energy B Implantation with Ge Preimplantation;MRS Proceedings;1995
4. Defects produced in Sip+ndiodes by B+implantation at liquid nitrogen temperature or −60 °C;Journal of Applied Physics;1994-04
5. B diffusion in Si predamaged with Si+ or Ge+ and preannealed at 200–1000°C;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1993-04