Surface and gas-phase observations of Ar-diluted c-C4F8 plasma by using real-time infrared spectroscopy and planar laser-induced fluorescence
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1536740
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1. Dissociation channels of c-C4F8 to C2F4 in reactive plasma;Japanese Journal of Applied Physics;2022-10-01
2. Selective etching of SiN against SiO2 and poly-Si films in hydrofluoroethane chemistry with a mixture of CH2FCHF2, O2, and Ar;Applied Surface Science;2021-03
3. Development of a probe-type optical absorption spectroscopic system for spatially resolved CF2 density measurement in inductively coupled C4F8/Ar plasmas;Review of Scientific Instruments;2020-01-01
4. Electron impact ionization of perfluoro-methyl-vinyl-ether C3F6O;Plasma Sources Science and Technology;2018-01-08
5. Etching yields and surface reactions of amorphous carbon by fluorocarbon ion irradiation;Japanese Journal of Applied Physics;2017-05-31
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