Proximity effect correction for electron beam lithography by equalization of background dose
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.332426
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1. Silicon transfer layer for multilayer resist systems
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4. Molecular parameters and lithographic performance of poly(chloromethylstyrene)—a high‐performance negative electron resist
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