Molecular parameters and lithographic performance of poly(chloromethylstyrene)—a high‐performance negative electron resist
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Published:1981-11
Issue:4
Volume:19
Page:1121-1126
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ISSN:0022-5355
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Container-title:Journal of Vacuum Science and Technology
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language:en
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Short-container-title:Journal of Vacuum Science and Technology
Author:
Choong H. S.,Kahn F. J.
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
58 articles.
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