Growth process and properties of silicon nitride deposited by hot-wire chemical vapor deposition
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1542658
Reference30 articles.
1. Deposition of device quality, lowHcontent amorphous silicon
2. Device-quality polycrystalline and amorphous silicon films by hot-wire chemical vapour deposition
3. Formation of Silicon-Based Thin Films Prepared by Catalytic Chemical Vapor Deposition (Cat-CVD) Method
4. Influence of gas supply and filament geometry on the large-area deposition of amorphous silicon by hot-wire CVD
5. A Cat-CVD Si3N4 film study and its application to the ULSI process
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