Device-quality polycrystalline and amorphous silicon films by hot-wire chemical vapour deposition
Author:
Affiliation:
1. a Utrecht University, Debye Institute , Po Box 80, 000, 3508 , Ta Utrecht , The Netherlands
Publisher
Informa UK Limited
Subject
General Physics and Astronomy,General Chemical Engineering
Link
https://www.tandfonline.com/doi/pdf/10.1080/01418639708241096
Reference28 articles.
1. Amorphous and microcrystalline silicon films deposited by hot‐wire chemical vapor deposition at filament temperatures between 1500 and 1900 °C
2. Polycrystalline silicon films obtained by hot-wire chemical vapour deposition
3. Properties of hydrogenated amorphous silicon produced at high temperature
4. Production of high‐quality amorphous silicon films by evaporative silane surface decomposition
5. Hydrogenated microcrystalline silicon films produced at low temperature by the hot wire deposition method
Cited by 128 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Semiconductor Nanomaterials;Chemistry of Semiconductors;2023-11-24
2. HWCVD: A Potential Tool for Silicon-Based Thin Films and Nanostructures;Recent Advances in Thin Films;2020
3. The optical properties of silicon carbide thin films prepared by HWCVD from pure silane and methane under various total gas partial pressure;Materials Research Express;2019-06-19
4. Introduction;Catalytic Chemical Vapor Deposition;2019-02-15
5. Low temperature growth of polycrystalline InN films on non-crystalline substrates by plasma-enhanced atomic layer deposition;Applied Surface Science;2018-11
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3