Two‐dimensional electron gas in a Ga0.47In0.53As/InP heterojunction grown by chemical beam epitaxy
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.97495
Reference11 articles.
1. Two-dimensional electron gas at a semiconductor-semiconductor interface
2. Chemical beam epitaxy of InP and GaAs
3. Chemical beam epitaxial growth of extremely high quality InGaAs on InP
4. Two‐dimensional electron gas at a molecular beam epitaxial‐grown, selectively doped, In0.53Ga0.47As‐In0.48Al0.52As interface
5. Two‐dimensional electron gas in a In0.53Ga0.47As‐InP heterojunction grown by metalorganic chemical vapor deposition
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2. Quantum and classical scattering time in two-dimensional electron gas in Ga0.47In0.53As/InP;Acta Physica Hungarica;1994-03
3. Novel applications of contactless characterization techniques in epitaxial crystals and quantum well structures;Journal of Crystal Growth;1993-03
4. Chemical beam epitaxy;Critical Reviews in Solid State and Materials Sciences;1992-01
5. Growth and characterization of GaAlAs/GaAs and GaInAs/InP structures: The effect of a pulse metalorganic flow;Journal of Applied Physics;1992-01
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