Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates-Reference-Cited by-同舟云学术

Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates

Published:2015-07-28 Issue:4 Volume:118 Page:045307
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Brennan Christopher J.¹,Neumann Christopher M.¹^ORCID,Vitale Steven A.¹^ORCID

Affiliation:

1. Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts 02420, USA

Funder

U.S. Air Force (United States Air Force)

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4927517

Reference37 articles.

1. K. Tai et al., in Proceedings of the 36th European Solid-State Device Research Conference (ESSDERC 2006), 19–21 September 2006 ( IEEE, Piscataway, NJ, USA, 2006), p. 121.

2. Threshold Voltage Modulation Technique using Fluorine Treatment through Atomic Layer Deposition TiN Suitable for Complementary Metal–Oxide–Semiconductor Devices

3. FDSOI Process Technology for Subthreshold-Operation Ultralow-Power Electronics

4. Work-Function-Tuned TiN Metal Gate FDSOI Transistors for Subthreshold Operation

5. Effect of Post-Treatments on Atomic Layer Deposition of TiN Thin Films Using Tetrakis(dimethylamido)titanium and Ammonia

Cited by 16 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Electrical Performance Determination and Stress Reliability Estimation of ALD- Derived Er₂O₃/InP Heterointerface;IEEE Transactions on Electron Devices;2023-12

2. A vertically paired electrode for redox cycling and its application to immunoassays;The Analyst;2023

3. Atomistic kinetic Monte Carlo simulation on atomic layer deposition of TiN thin film;Computational Materials Science;2022-10

4. Capacitive biosensor based on vertically paired electrodes for the detection of SARS-CoV-2;Biosensors and Bioelectronics;2022-04

5. Recent Advances in Hollow Cathode Technology for Plasma-Enhanced ALD—Plasma Surface Modifications for Aluminum and Stainless-Steel Cathodes;Coatings;2021-12-07