High‐resolution pattern definition in tungsten
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.92876
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1. Qualitative Interpretation of Etch Profile Nonuniformity Using a Wavelet and a Neural Network;Journal of the Korean Physical Society;2003-11-15
2. Use of neural networks to model low-temperature tungsten etch characteristics in high density SF6 plasma;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2000-03
3. Metal gates for advanced CMOS technology;SPIE Proceedings;1999-09-01
4. Surface diffusion model accounting for the temperature dependence of tungsten etching characteristics in a SF[sub 6] magnetoplasma;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1998-05
5. Effect of CO and CO2 addition to the CF4/O2 gas system on the etching of a low-pressure chemical vapor deposition tungsten film;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1995-05
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