Effect of gas impurity and ion bombardment on stresses in sputter‐deposited thin films: A molecular‐dynamics approach-Reference-Cited by-同舟云学术

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Effect of gas impurity and ion bombardment on stresses in sputter‐deposited thin films: A molecular‐dynamics approach

Published:1993-10-01 Issue:7 Volume:74 Page:4472-4482
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:

Author:

Fang C. C.¹,Jones F.²,Prasad V.¹

Affiliation:

1. Department of Mechanical Engineering, Columbia University, New York, New York 10027

2. IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Reference36 articles.

1. J. D. Wilcock, D. S. Campbell, and J. C. Anderson, Thin Solid Films 3, 13 (1969).THSFAP0040-6090

2. E. Klokholm and B. S. Berry, J. Electrochem. Soc. 115, 823 (1968).JESOAN0013-4651

3. D. W. Hoffman and J. A. Thornton, J. Vac. Sci. Technol. 20, 355 (1982).JVSTAL0022-5355

4. J. A. Thornton and D. W. Hoffman, J. Vac. Sci. Technol. 14, 164 (1977).JVSTAL0022-5355

5. R. C. Sun, T. C. Tisone, and P. D. Cruzan, J. Appl. Phys. 46, 112 (1975).JAPIAU0021-8979

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